Z. V. Apanovich, Alexander G. Marchuk. Top-Down Approach to Technology Migration for Full-Custom Mask Layouts. In 11th International Conference on VLSI Design (VLSI Design 1991), 4-7 January 1998, Chennai, India. pages 48-52, IEEE Computer Society, 1998. [doi]
@inproceedings{ApanovichM98,
title = {Top-Down Approach to Technology Migration for Full-Custom Mask Layouts},
author = {Z. V. Apanovich and Alexander G. Marchuk},
year = {1998},
doi = {10.1109/ICVD.1998.646577},
url = {http://doi.ieeecomputersociety.org/10.1109/ICVD.1998.646577},
tags = {layout, migration, systematic-approach},
researchr = {https://researchr.org/publication/ApanovichM98},
cites = {0},
citedby = {0},
pages = {48-52},
booktitle = {11th International Conference on VLSI Design (VLSI Design 1991), 4-7 January 1998, Chennai, India},
publisher = {IEEE Computer Society},
}