Yongchan Ban, Kevin Lucas, David Z. Pan. Flexible 2D layout decomposition framework for spacer-type double pattering lithography. In Leon Stok, Nikil D. Dutt, Soha Hassoun, editors, Proceedings of the 48th Design Automation Conference, DAC 2011, San Diego, California, USA, June 5-10, 2011. pages 789-794, ACM, 2011. [doi]
@inproceedings{BanLP11, title = {Flexible 2D layout decomposition framework for spacer-type double pattering lithography}, author = {Yongchan Ban and Kevin Lucas and David Z. Pan}, year = {2011}, doi = {10.1145/2024724.2024901}, url = {http://doi.acm.org/10.1145/2024724.2024901}, researchr = {https://researchr.org/publication/BanLP11}, cites = {0}, citedby = {0}, pages = {789-794}, booktitle = {Proceedings of the 48th Design Automation Conference, DAC 2011, San Diego, California, USA, June 5-10, 2011}, editor = {Leon Stok and Nikil D. Dutt and Soha Hassoun}, publisher = {ACM}, isbn = {978-1-4503-0636-2}, }