Yongchan Ban, Kevin Lucas, David Z. Pan. Flexible 2D layout decomposition framework for spacer-type double pattering lithography. In Leon Stok, Nikil D. Dutt, Soha Hassoun, editors, Proceedings of the 48th Design Automation Conference, DAC 2011, San Diego, California, USA, June 5-10, 2011. pages 789-794, ACM, 2011. [doi]
Abstract is missing.