Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography - researchr publication authors

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Yongchan Ban, David Z. Pan. Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography. In Sachin S. Sapatnekar, editor, Proceedings of the 47th Design Automation Conference, DAC 2010, Anaheim, California, USA, July 13-18, 2010. pages 408-411, ACM, 2010. [doi]

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