Yongchan Ban, David Z. Pan. Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography. In Sachin S. Sapatnekar, editor, Proceedings of the 47th Design Automation Conference, DAC 2010, Anaheim, California, USA, July 13-18, 2010. pages 408-411, ACM, 2010. [doi]
@inproceedings{BanP10,
title = {Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography},
author = {Yongchan Ban and David Z. Pan},
year = {2010},
doi = {10.1145/1837274.1837375},
url = {http://doi.acm.org/10.1145/1837274.1837375},
tags = {optimization, layout, modeling},
researchr = {https://researchr.org/publication/BanP10},
cites = {0},
citedby = {0},
pages = {408-411},
booktitle = {Proceedings of the 47th Design Automation Conference, DAC 2010, Anaheim, California, USA, July 13-18, 2010},
editor = {Sachin S. Sapatnekar},
publisher = {ACM},
isbn = {978-1-4503-0002-5},
}