Optimal phase conflict removal for layout of dark field alternatingphase shifting masks - researchr publication authors

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Piotr Berman, Andrew B. Kahng, Devendra Vidhani, Huijuan Wang, Alexander Zelikovsky. Optimal phase conflict removal for layout of dark field alternatingphase shifting masks. IEEE Trans. on CAD of Integrated Circuits and Systems, 19(2):175-187, 2000. [doi]

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