Piotr Berman, Andrew B. Kahng, Devendra Vidhani, Huijuan Wang, Alexander Zelikovsky. Optimal phase conflict removal for layout of dark field alternatingphase shifting masks. IEEE Trans. on CAD of Integrated Circuits and Systems, 19(2):175-187, 2000. [doi]
@article{BermanKVWZ00,
title = {Optimal phase conflict removal for layout of dark field alternatingphase shifting masks},
author = {Piotr Berman and Andrew B. Kahng and Devendra Vidhani and Huijuan Wang and Alexander Zelikovsky},
year = {2000},
doi = {10.1109/43.828546},
url = {http://doi.ieeecomputersociety.org/10.1109/43.828546},
tags = {layout},
researchr = {https://researchr.org/publication/BermanKVWZ00},
cites = {0},
citedby = {0},
journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
volume = {19},
number = {2},
pages = {175-187},
}