Large area recrystallization of thick polysilicon films for low cost partial SOI power devices

I. Bertrand, Jean-Marie Dilhac, P. Renaud, Christian Ganibal. Large area recrystallization of thick polysilicon films for low cost partial SOI power devices. Microelectronics Journal, 37(3):257-261, 2006. [doi]

@article{BertrandDRG06,
  title = {Large area recrystallization of thick polysilicon films for low cost partial SOI power devices},
  author = {I. Bertrand and Jean-Marie Dilhac and P. Renaud and Christian Ganibal},
  year = {2006},
  doi = {10.1016/j.mejo.2005.09.029},
  url = {http://dx.doi.org/10.1016/j.mejo.2005.09.029},
  researchr = {https://researchr.org/publication/BertrandDRG06},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Journal},
  volume = {37},
  number = {3},
  pages = {257-261},
}