R. Buckmaster, J. H. Yoo, K. Shin, Y. Yao, T. Sekiguchi, M. Yokoyama, T. Hanada, T. Goto, M. Cho, Y. Kawazoe. GaN nanodot fabrication by implant source growth. Microelectronics Journal, 36(3-6):456-459, 2005. [doi]
@article{BuckmasterYSYSYHGCK05,
title = {GaN nanodot fabrication by implant source growth},
author = {R. Buckmaster and J. H. Yoo and K. Shin and Y. Yao and T. Sekiguchi and M. Yokoyama and T. Hanada and T. Goto and M. Cho and Y. Kawazoe},
year = {2005},
doi = {10.1016/j.mejo.2005.02.046},
url = {http://dx.doi.org/10.1016/j.mejo.2005.02.046},
tags = {source-to-source, peer-to-peer, open-source},
researchr = {https://researchr.org/publication/BuckmasterYSYSYHGCK05},
cites = {0},
citedby = {0},
journal = {Microelectronics Journal},
volume = {36},
number = {3-6},
pages = {456-459},
}