Electrical properties of metal-HfO::2::-silicon system measured from metal-insulator-semiconductor capacitors and metal-insulator-semiconductor field-effect transistors using HfO::2:: gate dielectric - researchr publication

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Fu-Chien Chiu, Shun-An Lin, Joseph Ya-min Lee. Electrical properties of metal-HfO::2::-silicon system measured from metal-insulator-semiconductor capacitors and metal-insulator-semiconductor field-effect transistors using HfO::2:: gate dielectric. Microelectronics Reliability, 45(5-6):961-964, 2005. [doi]

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