Debaprasad Das, Hafizur Rahaman. Crosstalk and Gate Oxide Reliability Analysis in Graphene Nanoribbon Interconnects. In International Symposium on Electronic System Design, ISED 2011, Kochi, Kerala, India, December 19-21, 2011. pages 182-187, IEEE, 2011. [doi]
@inproceedings{DasR11-3,
title = {Crosstalk and Gate Oxide Reliability Analysis in Graphene Nanoribbon Interconnects},
author = {Debaprasad Das and Hafizur Rahaman},
year = {2011},
doi = {10.1109/ISED.2011.54},
url = {http://doi.ieeecomputersociety.org/10.1109/ISED.2011.54},
researchr = {https://researchr.org/publication/DasR11-3},
cites = {0},
citedby = {0},
pages = {182-187},
booktitle = {International Symposium on Electronic System Design, ISED 2011, Kochi, Kerala, India, December 19-21, 2011},
publisher = {IEEE},
isbn = {978-1-4577-1880-9},
}