Yixiao Ding, Chris C. N. Chu, Wai-Kei Mak. Detailed routing for spacer-is-metal type self-aligned double/quadruple patterning lithography. In Proceedings of the 52nd Annual Design Automation Conference, San Francisco, CA, USA, June 7-11, 2015. pages 69, ACM, 2015. [doi]
@inproceedings{DingCM15,
title = {Detailed routing for spacer-is-metal type self-aligned double/quadruple patterning lithography},
author = {Yixiao Ding and Chris C. N. Chu and Wai-Kei Mak},
year = {2015},
doi = {10.1145/2744769.2744821},
url = {http://doi.acm.org/10.1145/2744769.2744821},
researchr = {https://researchr.org/publication/DingCM15},
cites = {0},
citedby = {0},
pages = {69},
booktitle = {Proceedings of the 52nd Annual Design Automation Conference, San Francisco, CA, USA, June 7-11, 2015},
publisher = {ACM},
isbn = {978-1-4503-3520-1},
}