Design of an aerostatic imprint head with off-plane alignment functionality for nanoimprint lithography

Chong Du, Weihai Chen, Yunjie Wu, Wenjie Chen, Mei Yuan. Design of an aerostatic imprint head with off-plane alignment functionality for nanoimprint lithography. In 2012 IEEE International Conference on Robotics and Biomimetics, ROBIO 2012, Guangzhou, China, December 11-14, 2012. pages 999-1004, IEEE, 2012. [doi]

@inproceedings{DuCWCY12,
  title = {Design of an aerostatic imprint head with off-plane alignment functionality for nanoimprint lithography},
  author = {Chong Du and Weihai Chen and Yunjie Wu and Wenjie Chen and Mei Yuan},
  year = {2012},
  doi = {10.1109/ROBIO.2012.6491099},
  url = {http://dx.doi.org/10.1109/ROBIO.2012.6491099},
  researchr = {https://researchr.org/publication/DuCWCY12},
  cites = {0},
  citedby = {0},
  pages = {999-1004},
  booktitle = {2012 IEEE International Conference on Robotics and Biomimetics, ROBIO 2012, Guangzhou, China, December 11-14, 2012},
  publisher = {IEEE},
  isbn = {978-1-4673-2125-9},
}