Geert Eneman, A. De Keersgieter, Anda Mocuta, Nadine Collaert, Aaron Thean. FinFET stressor efficiency on alternative wafer and channel orientations for the 14 nm node and below. In 2015 International Conference on IC Design & Technology, ICICDT 2015, Leuven, Belgium, June 1-3, 2015. pages 1-4, IEEE, 2015. [doi]
Abstract is missing.