Shao-Yun Fang, Yao-Wen Chang, Wei-Yu Chen. A Novel Layout Decomposition Algorithm for Triple Patterning Lithography. IEEE Trans. on CAD of Integrated Circuits and Systems, 33(3):397-408, 2014. [doi]
@article{FangCC14,
title = {A Novel Layout Decomposition Algorithm for Triple Patterning Lithography},
author = {Shao-Yun Fang and Yao-Wen Chang and Wei-Yu Chen},
year = {2014},
doi = {10.1109/TCAD.2013.2288678},
url = {http://dx.doi.org/10.1109/TCAD.2013.2288678},
researchr = {https://researchr.org/publication/FangCC14},
cites = {0},
citedby = {0},
journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
volume = {33},
number = {3},
pages = {397-408},
}