The following publications are possibly variants of this publication:
- A novel layout decomposition algorithm for triple patterning lithographyShao-Yun Fang, Yao-Wen Chang, Wei-Yu Chen. dac 2012: 1185-1190 [doi]
- A Cell-Based Row-Structure Layout Decomposer for Triple Patterning LithographyHsi-An Chien, Szu-Yuan Han, Ye Hong Chen, Ting-Chi Wang. ispd 2015: 67-74 [doi]
- SUALD: Spacing uniformity-aware layout decomposition in triple patterning lithographyZihao Chen, Hailong Yao, Yici Cai. isqed 2013: 566-571 [doi]
- LRSDP: Low-Rank SDP for Triple Patterning Lithography Layout DecompositionYu Zhang, Yifan Chen, Zhonglin Xie, Hong Xu, Zaiwen Wen, Yibo Lin, Bei Yu 0001. dac 2023: 1-6 [doi]