High-Rate Oblique Deposition of SiO::2:: Films Using Two Sputtering Sources - researchr publication authors

researchr

You are not signed in
Sign in
Sign up

Yoichi Hoshi, Kensuke Yagi, Eisuke Suzuki, Hao Lei, Akira Sakai. High-Rate Oblique Deposition of SiO::2:: Films Using Two Sputtering Sources. IEICE Transactions, 91-C(10):1644-1648, 2008. [doi]

This author has not been identified. Look up 'Yoichi Hoshi' in GoogleThis author has not been identified. Look up 'Kensuke Yagi' in GoogleThis author has not been identified. Look up 'Eisuke Suzuki' in GoogleThis author has not been identified. Look up 'Hao Lei' in GoogleThis author has not been identified. Look up 'Akira Sakai' in Google

runs on WebDSL