Yoichi Hoshi, Kensuke Yagi, Eisuke Suzuki, Hao Lei, Akira Sakai. High-Rate Oblique Deposition of SiO::2:: Films Using Two Sputtering Sources. IEICE Transactions, 91-C(10):1644-1648, 2008. [doi]
@article{HoshiYSLS08,
title = {High-Rate Oblique Deposition of SiO::2:: Films Using Two Sputtering Sources},
author = {Yoichi Hoshi and Kensuke Yagi and Eisuke Suzuki and Hao Lei and Akira Sakai},
year = {2008},
doi = {10.1093/ietele/e91-c.10.1644},
url = {http://dx.doi.org/10.1093/ietele/e91-c.10.1644},
tags = {source-to-source, open-source},
researchr = {https://researchr.org/publication/HoshiYSLS08},
cites = {0},
citedby = {0},
journal = {IEICE Transactions},
volume = {91-C},
number = {10},
pages = {1644-1648},
}