Simultaneous Layout Migration and Decomposition for Double Patterning Technology

Chin-Hsiung Hsu, Yao-Wen Chang, Sani R. Nassif. Simultaneous Layout Migration and Decomposition for Double Patterning Technology. IEEE Trans. on CAD of Integrated Circuits and Systems, 30(2):284-294, 2011. [doi]

Authors

Chin-Hsiung Hsu

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Yao-Wen Chang

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Sani R. Nassif

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