Chin-Hsiung Hsu, Yao-Wen Chang, Sani R. Nassif. Simultaneous Layout Migration and Decomposition for Double Patterning Technology. IEEE Trans. on CAD of Integrated Circuits and Systems, 30(2):284-294, 2011. [doi]
@article{HsuCN11,
title = {Simultaneous Layout Migration and Decomposition for Double Patterning Technology},
author = {Chin-Hsiung Hsu and Yao-Wen Chang and Sani R. Nassif},
year = {2011},
doi = {10.1109/TCAD.2010.2079990},
url = {http://dx.doi.org/10.1109/TCAD.2010.2079990},
tags = {layout, migration},
researchr = {https://researchr.org/publication/HsuCN11},
cites = {0},
citedby = {0},
journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
volume = {30},
number = {2},
pages = {284-294},
}