Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer

Chia-Wei Hsu, Yean-Kuen Fang, Wen-Kuan Yeh, Chien Ting Lin. Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer. Microelectronics Reliability, 48(11-12):1791-1794, 2008. [doi]

Authors

Chia-Wei Hsu

This author has not been identified. Look up 'Chia-Wei Hsu' in Google

Yean-Kuen Fang

This author has not been identified. Look up 'Yean-Kuen Fang' in Google

Wen-Kuan Yeh

This author has not been identified. Look up 'Wen-Kuan Yeh' in Google

Chien Ting Lin

This author has not been identified. Look up 'Chien Ting Lin' in Google