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Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer

Chia-Wei Hsu, Yean-Kuen Fang, Wen-Kuan Yeh, Chien Ting Lin. Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer. Microelectronics Reliability, 48(11-12):1791-1794, 2008. [doi]

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