A physical model on electron mobility in InGaAs nMOSFETs with stacked gate dielectric

Y. Huang, J. P. Xu, L. S. Wang, S. Y. Zhu. A physical model on electron mobility in InGaAs nMOSFETs with stacked gate dielectric. Microelectronics Reliability, 55(2):342-346, 2015. [doi]

Abstract

Abstract is missing.