Investigation on negative capacitance FinEFT beyond 7 nm node from device to circuit - researchr publication authors

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Jiali Huo, Weixing Huang, Fan Zhang, Shengli Zhang, Weizhuo Gan, Qiang Huo, Yuwei Cai, Qingzhu Zhang, Yongliang Li, Huilong Zhu, Huaxiang Yin, Zhenhua Wu. Investigation on negative capacitance FinEFT beyond 7 nm node from device to circuit. Microelectronics Journal, 116:105196, 2021. [doi]

This author has not been identified. Look up 'Jiali Huo' in GoogleThis author has not been identified. Look up 'Weixing Huang' in GoogleThis author has not been identified. Look up 'Fan Zhang' in GoogleThis author has not been identified. Look up 'Shengli Zhang' in GoogleThis author has not been identified. Look up 'Weizhuo Gan' in GoogleThis author has not been identified. Look up 'Qiang Huo' in GoogleThis author has not been identified. Look up 'Yuwei Cai' in GoogleThis author has not been identified. Look up 'Qingzhu Zhang' in GoogleThis author has not been identified. Look up 'Yongliang Li' in GoogleThis author has not been identified. Look up 'Huilong Zhu' in GoogleThis author has not been identified. Look up 'Huaxiang Yin' in GoogleThis author has not been identified. Look up 'Zhenhua Wu' in Google

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