Characterisation and passivation of interface defects in (1 0 0)-Si/SiO::2::/HfO::2::/TiN gate stacks - researchr publication authors

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P. K. Hurley, K. Cherkaoui, S. McDonnell, G. Hughes, A. W. Groenland. Characterisation and passivation of interface defects in (1 0 0)-Si/SiO::2::/HfO::2::/TiN gate stacks. Microelectronics Reliability, 47(8):1195-1201, 2007. [doi]

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