Characterisation and passivation of interface defects in (1 0 0)-Si/SiO::2::/HfO::2::/TiN gate stacks

P. K. Hurley, K. Cherkaoui, S. McDonnell, G. Hughes, A. W. Groenland. Characterisation and passivation of interface defects in (1 0 0)-Si/SiO::2::/HfO::2::/TiN gate stacks. Microelectronics Reliability, 47(8):1195-1201, 2007. [doi]

@article{HurleyCMHG07,
  title = {Characterisation and passivation of interface defects in (1 0 0)-Si/SiO::2::/HfO::2::/TiN gate stacks},
  author = {P. K. Hurley and K. Cherkaoui and S. McDonnell and G. Hughes and A. W. Groenland},
  year = {2007},
  doi = {10.1016/j.microrel.2006.09.030},
  url = {http://dx.doi.org/10.1016/j.microrel.2006.09.030},
  researchr = {https://researchr.org/publication/HurleyCMHG07},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {47},
  number = {8},
  pages = {1195-1201},
}