A 0.8V V_MIN Ultra-Low Leakage High Density 6T SRAM in 40nm CMOS Technology Using Repeated-Pulse Wordline Suppression Scheme

Ashish Kumar, Mohammad Aftab Alam, Gangaikondan S. Visweswaran. A 0.8V V_MIN Ultra-Low Leakage High Density 6T SRAM in 40nm CMOS Technology Using Repeated-Pulse Wordline Suppression Scheme. In 32nd International Conference on VLSI Design and 2019 18th International Conference on Embedded Systems, VLSID 2019, Delhi, India, January 5-9, 2019. pages 547-548, IEEE, 2019. [doi]

Authors

Ashish Kumar

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Mohammad Aftab Alam

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Gangaikondan S. Visweswaran

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