1.5-nm Node Surrounding Gate Transistor (SGT)-SRAM Cell with Staggered Pillar and Self-Aligned Process for Gate, Bottom Contact, and Pillar

Yisuo Li, Ken'ichi Kanazawa, Tetsuo Izawa, Koji Sakui, Georg Strof, Oskar Baumgartner, Gerhard Rzepa, Markus Karner, Zlatan Stanojevic, Nozomu Harada, Fujio Masuoka. 1.5-nm Node Surrounding Gate Transistor (SGT)-SRAM Cell with Staggered Pillar and Self-Aligned Process for Gate, Bottom Contact, and Pillar. In IEEE International Memory Workshop, IMW 2021, Dresden, Germany, May 16-19, 2021. pages 1-4, IEEE, 2021. [doi]

Abstract

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