Investigation of Dynamic Leakage-Suppression Logic Techniques Crossing Different Technology Nodes from 180 nm Bulk CMOS to 7 nm FinFET Plus Process

Jieyu Li, Zihan Lian, Hao Zhang, Weifeng He, Yanan Sun, Mingoo Seok. Investigation of Dynamic Leakage-Suppression Logic Techniques Crossing Different Technology Nodes from 180 nm Bulk CMOS to 7 nm FinFET Plus Process. In IEEE International Symposium on Circuits and Systems, ISCAS 2021, Daegu, South Korea, May 22-28, 2021. pages 1-5, IEEE, 2021. [doi]

@inproceedings{LiLZHSS21,
  title = {Investigation of Dynamic Leakage-Suppression Logic Techniques Crossing Different Technology Nodes from 180 nm Bulk CMOS to 7 nm FinFET Plus Process},
  author = {Jieyu Li and Zihan Lian and Hao Zhang and Weifeng He and Yanan Sun and Mingoo Seok},
  year = {2021},
  doi = {10.1109/ISCAS51556.2021.9401171},
  url = {https://doi.org/10.1109/ISCAS51556.2021.9401171},
  researchr = {https://researchr.org/publication/LiLZHSS21},
  cites = {0},
  citedby = {0},
  pages = {1-5},
  booktitle = {IEEE International Symposium on Circuits and Systems, ISCAS 2021, Daegu, South Korea, May 22-28, 2021},
  publisher = {IEEE},
  isbn = {978-1-7281-9201-7},
}