The following publications are possibly variants of this publication:
- Fabrication of deep lateral single-crystal-silicon blaze micro-grating by Inductively-Coupled-Plasma Reactive Ion EtchY.-H. Lin, C. J. Weng, C.-Y. Su, W. Hsu. nems 2012: 689-692 [doi]
- Investigation of fabricated Through Glass Via (TGV) process by inductively coupled plasma reactive ion etching of quartz glassYu-Hsiang Tang, Yu-Hsin Lin, Tsung-Tao Huang, Jun-Sheng Wang, Ming-Hua Shiao, Chih-Sheng Yu. nems 2015: 401-404 [doi]
- Surface property study of different patterning sapphire structures by ICP-RIEChun-Ming Chang, Ming-Hua Shiao, Donyau Chiang, Mao-Jung Huang, Chin-Tien Yang, Wen-Jeng Hsueh. nems 2013: 372-375 [doi]
- A parametric study of ICP-RIE etching on a lithium niobate substrateChun-Ming Chang, Chih-Sheng Yu, Fan-Chun Hsieh, Chun-Ting Lin, Tsung-Tao Huang, Ping-Hung Lin, Jiann-Shiun Kao, Tsung-Tao Huang, Chien-Nan Hsiao, Ming-Hua Shiao. nems 2015: 485-486 [doi]