Hot Carrier Reliability Improvement of Thicker Gate Oxide nFET Devices in Advanced FinFETs

M. Iqbal Mahmud, A. Gupta, Maria Toledano-Luque, N. Mavilla, J. Johnson, P. Srinivasan, A. Zainuddin, S. Rao, S. Cimino, B. Min, Tanya Nigam. Hot Carrier Reliability Improvement of Thicker Gate Oxide nFET Devices in Advanced FinFETs. In IEEE International Reliability Physics Symposium, IRPS 2019, Monterey, CA, USA, March 31 - April 4, 2019. pages 1-6, IEEE, 2019. [doi]

Abstract

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