Process variation effects on circuit performance: TCAD simulation of 256-Mbit technology [DRAMs]

C. S. Murthy, M. Gall. Process variation effects on circuit performance: TCAD simulation of 256-Mbit technology [DRAMs]. IEEE Trans. on CAD of Integrated Circuits and Systems, 16(11):1383-1389, 1997. [doi]

@article{MurthyG97:0,
  title = {Process variation effects on circuit performance: TCAD simulation of 256-Mbit technology [DRAMs]},
  author = {C. S. Murthy and M. Gall},
  year = {1997},
  doi = {10.1109/43.663828},
  url = {http://doi.ieeecomputersociety.org/10.1109/43.663828},
  tags = {C++},
  researchr = {https://researchr.org/publication/MurthyG97%3A0},
  cites = {0},
  citedby = {0},
  journal = {IEEE Trans. on CAD of Integrated Circuits and Systems},
  volume = {16},
  number = {11},
  pages = {1383-1389},
}