Intra- and inter-chip electrical interconnection formed by directed self assembly of nanocomposite containing diblock copolymer and nanometal

Mariappan Murugesan, Takafumi Fukushima, Ji Chel Bea, H. Hashimoto, Mitsu Koyanagi. Intra- and inter-chip electrical interconnection formed by directed self assembly of nanocomposite containing diblock copolymer and nanometal. In IEEE International Reliability Physics Symposium, IRPS 2018, Burlingame, CA, USA, March 11-15, 2018. pages 4, IEEE, 2018. [doi]

Authors

Mariappan Murugesan

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Takafumi Fukushima

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Ji Chel Bea

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H. Hashimoto

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Mitsu Koyanagi

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