Intra- and inter-chip electrical interconnection formed by directed self assembly of nanocomposite containing diblock copolymer and nanometal

Mariappan Murugesan, Takafumi Fukushima, Ji Chel Bea, H. Hashimoto, Mitsu Koyanagi. Intra- and inter-chip electrical interconnection formed by directed self assembly of nanocomposite containing diblock copolymer and nanometal. In IEEE International Reliability Physics Symposium, IRPS 2018, Burlingame, CA, USA, March 11-15, 2018. pages 4, IEEE, 2018. [doi]

Abstract

Abstract is missing.