Variation-Aware Physics-Based Electromigration Modeling and Experimental Calibration for VLSI Interconnects

Sarath Mohanachandran Nair, Rajendra Bishnoi, Mehdi Baradaran Tahoori, Houman Zahedmanesh, Kristof Croes, Kevin Garello, Gouri Sankar Kar, Francky Catthoor. Variation-Aware Physics-Based Electromigration Modeling and Experimental Calibration for VLSI Interconnects. In IEEE International Reliability Physics Symposium, IRPS 2019, Monterey, CA, USA, March 31 - April 4, 2019. pages 1-6, IEEE, 2019. [doi]

@inproceedings{NairBTZCGKC19,
  title = {Variation-Aware Physics-Based Electromigration Modeling and Experimental Calibration for VLSI Interconnects},
  author = {Sarath Mohanachandran Nair and Rajendra Bishnoi and Mehdi Baradaran Tahoori and Houman Zahedmanesh and Kristof Croes and Kevin Garello and Gouri Sankar Kar and Francky Catthoor},
  year = {2019},
  doi = {10.1109/IRPS.2019.8720559},
  url = {https://doi.org/10.1109/IRPS.2019.8720559},
  researchr = {https://researchr.org/publication/NairBTZCGKC19},
  cites = {0},
  citedby = {0},
  pages = {1-6},
  booktitle = {IEEE International Reliability Physics Symposium, IRPS 2019, Monterey, CA, USA, March 31 - April 4, 2019},
  publisher = {IEEE},
  isbn = {978-1-5386-9504-3},
}