Ankur Nipane, Punnu Jose Sebastian, Younghun Jung, Min Sup Choi, Abhinandan Borah, Won Jong Yoo, James Hone, James T. Teherani. Atomic Layer Etching (ALE) of WSe2 Yielding High Mobility p-FETs. In Device Research Conference, DRC 2019, Ann Arbor, MI, USA, June 23-26, 2019. pages 231-232, IEEE, 2019. [doi]
@inproceedings{NipaneSJCBYHT19,
title = {Atomic Layer Etching (ALE) of WSe2 Yielding High Mobility p-FETs},
author = {Ankur Nipane and Punnu Jose Sebastian and Younghun Jung and Min Sup Choi and Abhinandan Borah and Won Jong Yoo and James Hone and James T. Teherani},
year = {2019},
doi = {10.1109/DRC46940.2019.9046402},
url = {https://doi.org/10.1109/DRC46940.2019.9046402},
researchr = {https://researchr.org/publication/NipaneSJCBYHT19},
cites = {0},
citedby = {0},
pages = {231-232},
booktitle = {Device Research Conference, DRC 2019, Ann Arbor, MI, USA, June 23-26, 2019},
publisher = {IEEE},
isbn = {978-1-7281-2112-3},
}