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Run-to-Run Control of an Atomic Layer Etching Process with a Machine Learning-Based Endpoint-Detection Control System

Feiyang Ou, Henrik Wang, Julius Suherman, Gerassimos Orkoulas, Panagiotis D. Christofides. Run-to-Run Control of an Atomic Layer Etching Process with a Machine Learning-Based Endpoint-Detection Control System. In 2025 European Control Conference, ECC 2025, Thessaloniki, Greece, June 24-27, 2025. pages 1720-1727, IEEE, 2025. [doi]

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