A novel approach to characterization of progressive breakdown in high-k/metal gate stacks - researchr publication authors

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R. Pagano, Salvatore Lombardo, F. Palumbo, P. Kirsch, S. A. Krishnan, C. Young, R. Choi, G. Bersuker, James H. Stathis. A novel approach to characterization of progressive breakdown in high-k/metal gate stacks. Microelectronics Reliability, 48(11-12):1759-1764, 2008. [doi]

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