Nanometer control of the markerless overlay process using thermal scanning probe lithography

Colin Rawlings, Urs Dürig, James L. Hedrick, Dan Coady, Armin Knoll. Nanometer control of the markerless overlay process using thermal scanning probe lithography. In IEEE/ASME International Conference on Advanced Intelligent Mechatronics, AIM 2014, Besancon, France, July 8-11, 2014. pages 1670-1675, IEEE, 2014. [doi]

@inproceedings{RawlingsDHCK14,
  title = {Nanometer control of the markerless overlay process using thermal scanning probe lithography},
  author = {Colin Rawlings and Urs Dürig and James L. Hedrick and Dan Coady and Armin Knoll},
  year = {2014},
  doi = {10.1109/AIM.2014.6878324},
  url = {https://doi.org/10.1109/AIM.2014.6878324},
  researchr = {https://researchr.org/publication/RawlingsDHCK14},
  cites = {0},
  citedby = {0},
  pages = {1670-1675},
  booktitle = {IEEE/ASME International Conference on Advanced Intelligent Mechatronics, AIM 2014, Besancon, France, July 8-11, 2014},
  publisher = {IEEE},
}