Nanometer control of the markerless overlay process using thermal scanning probe lithography

Colin Rawlings, Urs Dürig, James L. Hedrick, Dan Coady, Armin Knoll. Nanometer control of the markerless overlay process using thermal scanning probe lithography. In IEEE/ASME International Conference on Advanced Intelligent Mechatronics, AIM 2014, Besancon, France, July 8-11, 2014. pages 1670-1675, IEEE, 2014. [doi]

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