Colin Rawlings, Urs Dürig, James L. Hedrick, Dan Coady, Armin Knoll. Nanometer control of the markerless overlay process using thermal scanning probe lithography. In IEEE/ASME International Conference on Advanced Intelligent Mechatronics, AIM 2014, Besancon, France, July 8-11, 2014. pages 1670-1675, IEEE, 2014. [doi]
Abstract is missing.