Field Tolerant Dynamic Intrinsic Chip ID Using 32 nm High-K/Metal Gate SOI Embedded DRAM - researchr publication authors

researchr

You are not signed in
Sign in
Sign up

Sami Rosenblatt, Daniel Fainstein, Alberto Cestero, John Safran, Norman Robson, Toshiaki Kirihata, Subramanian S. Iyer. Field Tolerant Dynamic Intrinsic Chip ID Using 32 nm High-K/Metal Gate SOI Embedded DRAM. J. Solid-State Circuits, 48(4):940-947, 2013. [doi]

This author has not been identified. Look up 'Sami Rosenblatt' in GoogleThis author has not been identified. Look up 'Daniel Fainstein' in GoogleThis author has not been identified. Look up 'Alberto Cestero' in GoogleThis author has not been identified. Look up 'John Safran' in GoogleThis author has not been identified. Look up 'Norman Robson' in GoogleThis author has not been identified. Look up 'Toshiaki Kirihata' in GoogleThis author has not been identified. Look up 'Subramanian S. Iyer' in Google

runs on WebDSL