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Lithography at a wavelength of 193 nm

Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek. Lithography at a wavelength of 193 nm. IBM Journal of Research and Development, 41(1&2):49-56, 1997. [doi]

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Mordechai Rothschild

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Anthony R. Forte

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Roderick R. Kunz

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Susan C. Palmateer

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Janusz H. C. Sedlacek

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