Lithography at a wavelength of 193 nm

Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek. Lithography at a wavelength of 193 nm. IBM Journal of Research and Development, 41(1&2):49-56, 1997. [doi]

Abstract

Abstract is missing.