Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek. Lithography at a wavelength of 193 nm. IBM Journal of Research and Development, 41(1&2):49-56, 1997. [doi]
@article{RothschildFKPS97,
title = {Lithography at a wavelength of 193 nm},
author = {Mordechai Rothschild and Anthony R. Forte and Roderick R. Kunz and Susan C. Palmateer and Janusz H. C. Sedlacek},
year = {1997},
doi = {10.1147/rd.411.0049},
url = {http://dx.doi.org/10.1147/rd.411.0049},
tags = {C++},
researchr = {https://researchr.org/publication/RothschildFKPS97},
cites = {0},
citedby = {0},
journal = {IBM Journal of Research and Development},
volume = {41},
number = {1&2},
pages = {49-56},
}