Redundant via insertion for multiple-patterning directed-self-assembly lithography - researchr publication authors

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Seongbo Shim, Woohyun Chung, Youngsoo Shin. Redundant via insertion for multiple-patterning directed-self-assembly lithography. In Proceedings of the 53rd Annual Design Automation Conference, DAC 2016, Austin, TX, USA, June 5-9, 2016. pages 41, ACM, 2016. [doi]

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