Redundant via insertion for multiple-patterning directed-self-assembly lithography

Seongbo Shim, Woohyun Chung, Youngsoo Shin. Redundant via insertion for multiple-patterning directed-self-assembly lithography. In Proceedings of the 53rd Annual Design Automation Conference, DAC 2016, Austin, TX, USA, June 5-9, 2016. pages 41, ACM, 2016. [doi]

@inproceedings{ShimCS16,
  title = {Redundant via insertion for multiple-patterning directed-self-assembly lithography},
  author = {Seongbo Shim and Woohyun Chung and Youngsoo Shin},
  year = {2016},
  doi = {10.1145/2897937.2898080},
  url = {http://doi.acm.org/10.1145/2897937.2898080},
  researchr = {https://researchr.org/publication/ShimCS16},
  cites = {0},
  citedby = {0},
  pages = {41},
  booktitle = {Proceedings of the 53rd Annual Design Automation Conference, DAC 2016, Austin, TX, USA, June 5-9, 2016},
  publisher = {ACM},
  isbn = {978-1-4503-4236-0},
}