The following publications are possibly variants of this publication:
- Redundant via insertion in directed self-assembly lithographyWoohyun Chung, Seongbo Shim, Youngsoo Shin. date 2016: 55-60 [doi]
- Cut Optimization for Redundant Via Insertion in Self-Aligned Double PatterningYoungsoo Song, Daijoon Hyun, Jingon Lee, Jinwook Jung, Youngsoo Shin. todaes, 24(6), 2019. [doi]
- Redundant Via Insertion with Cut Optimization for Self-Aligned Double PatterningYoungsoo Song, Jinwook Jung, Youngsoo Shin. glvlsi 2017: 137-142 [doi]
- Fast Verification of Guide-Patterns for Directed Self-Assembly LithographySeongbo Shim, Youngsoo Shin. tcad, 36(9):1522-1531, 2017. [doi]
- Cut mask optimization for multi-patterning directed self-assembly lithographyWachirawit Ponghiran, Seongbo Shim, Youngsoo Shin. date 2017: 1498-1503 [doi]