High Mobility n and p Channels on Gallium Arsenide and Silicon Substrates Using Interfacial Misfit Dislocation Arrays

Darryl Shima, Ganesh Balakrishnan. High Mobility n and p Channels on Gallium Arsenide and Silicon Substrates Using Interfacial Misfit Dislocation Arrays. In IEEE Computer Society Annual Symposium on VLSI, ISVLSI 2014, Tampa, FL, USA, July 9-11, 2014. pages 374-379, IEEE, 2014. [doi]

@inproceedings{ShimaB14,
  title = {High Mobility n and p Channels on Gallium Arsenide and Silicon Substrates Using Interfacial Misfit Dislocation Arrays},
  author = {Darryl Shima and Ganesh Balakrishnan},
  year = {2014},
  doi = {10.1109/ISVLSI.2014.99},
  url = {http://dx.doi.org/10.1109/ISVLSI.2014.99},
  researchr = {https://researchr.org/publication/ShimaB14},
  cites = {0},
  citedby = {0},
  pages = {374-379},
  booktitle = {IEEE Computer Society Annual Symposium on VLSI, ISVLSI 2014, Tampa, FL, USA, July 9-11, 2014},
  publisher = {IEEE},
}