Optimization of low temperature silicon nitride processes for improvement of device performance

E. Sleeckx, Marc Schaekers, X. Shi, E. Kunnen, B. Degroote, M. Jurczak, M. de Potter de ten Broeck, E. Augendre. Optimization of low temperature silicon nitride processes for improvement of device performance. Microelectronics Reliability, 45(5-6):865-868, 2005. [doi]

@article{SleeckxSSKDJBA05,
  title = {Optimization of low temperature silicon nitride processes for improvement of device performance},
  author = {E. Sleeckx and Marc Schaekers and X. Shi and E. Kunnen and B. Degroote and M. Jurczak and M. de Potter de ten Broeck and E. Augendre},
  year = {2005},
  doi = {10.1016/j.microrel.2004.10.028},
  url = {http://dx.doi.org/10.1016/j.microrel.2004.10.028},
  tags = {optimization, e-science},
  researchr = {https://researchr.org/publication/SleeckxSSKDJBA05},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {45},
  number = {5-6},
  pages = {865-868},
}